Nt: Not applicable. Informed Consent Statement: Not applicable. Data Availability Statement: The data presented within this study are accessible on request in the corresponding author. Acknowledgments: The authors thank Fuqiang Lin for his recommendations in this study. Conflicts of Interest: The authors declare no conflict of interest.
applied sciencesArticleUniform Pressing Mechanism in Large-Area Roll-to-Roll Carbazeran Purity & Documentation Nanoimprint Lithography ProcessGa Eul Kim 1,two, , Hyuntae Kim 1, , Kyoohee Woo 1 , Yousung Kang 2 , Seung-Hyun Lee 1 , Yongho Jeon two , Moon G. Lee two, and Sin Kwon 1, Department of Printed Electronics, Nano-Convergence Manufacturing Systems Research Division, Korea Institute Machinery Components (KIMM), Daejeon-si 34103, Korea; [email protected] (G.E.K.); [email protected] (H.K.); [email protected] (K.W.); [email protected] (S.-H.L.) Department of Mechanical Engineering, Ajou University, Suwon-si 16499, Korea; [email protected] (Y.K.); [email protected] (Y.J.) Correspondence: [email protected] (M.G.L.); [email protected] (S.K.); Tel.: +82-219-2338 (M.G.L.); +82-42-868-7219 (S.K.) These authors contributed equally to this work.Citation: Kim, G.E.; Kim, H.; Woo, K.; Kang, Y.; Lee, S.-H.; Jeon, Y.; Lee, M.G.; Kwon, S. Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Procedure. Appl. Sci. 2021, 11, 9571. https://doi.org/10.3390/ app11209571 Academic Editor: Arkadiusz Gola Received: 17 September 2021 Accepted: 7 October 2021 Published: 14 OctoberAbstract: We aimed to increase the processing location of your roll-to-roll (R2R) nanoimprint lithography (NIL) course of action for higher productivity, using a lengthy roller. It truly is prevalent to get a lengthy roller to possess bending deformation, geometric errors and misalignment. This causes the non-uniformity of speak to stress between the rollers, which results in defects including non-uniform patterning. The non-uniformity on the get in touch with pressure with the traditional R2R NIL method was investigated by way of finite element (FE) evaluation and experiments in the conventional technique. To solve the issue, a brand new large-area R2R NIL uniform pressing system with five multi-backup rollers was proposed and manufactured rather of your standard technique. As a preliminary experiment, the possibility of uniform get in touch with stress was confirmed by using only the stress at both ends and one particular backup roller in the center. A extra even get in touch with pressure was achieved by using all five backup rollers and applying an proper pushing force to every single backup roller. Machine learning methods were applied to locate the optimal mixture of your pushing forces. Within the standard pressing process, it was confirmed that pressure deviation on the make contact with region occurred at a level of 44 ; when the improved system was applied, pressure deviation dropped to 5 . Keyword phrases: roller bending; speak to pressure; roll-to-roll procedure; nanoimprint lithography; higher productivity1. Introduction Nanoimprint lithography (NIL), which was introduced by Chou in 1995, has been regarded as a promising technologies with outstanding advantages. Based on the mechanical deformation of a curable resist, NIL is a fabrication process in which a substrate is coated as well as a preferred pattern is pressed in to the coating to replicate an inverse pattern [1]. Because it makes it probable to effortlessly replicate patterns using molds with fine patterns, NIL technologies is highly applicable towards the manufacturing process of functional (S)-Mephenytoin Protocol optical devices, semiconductors or displ.
