Nt: Not applicable. Informed Consent Statement: Not applicable. Data Availability Statement: The information presented within this study are readily available on request in the corresponding author. Acknowledgments: The authors thank ML-211 MAGL Fuqiang Lin for his suggestions in this study. Conflicts of Interest: The authors declare no conflict of Spermine NONOate Purity Interest.
applied sciencesArticleUniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography ProcessGa Eul Kim 1,two, , Hyuntae Kim 1, , Kyoohee Woo 1 , Yousung Kang 2 , Seung-Hyun Lee 1 , Yongho Jeon two , Moon G. Lee 2, and Sin Kwon 1, Division of Printed Electronics, Nano-Convergence Manufacturing Systems Investigation Division, Korea Institute Machinery Materials (KIMM), Daejeon-si 34103, Korea; [email protected] (G.E.K.); [email protected] (H.K.); [email protected] (K.W.); [email protected] (S.-H.L.) Division of Mechanical Engineering, Ajou University, Suwon-si 16499, Korea; [email protected] (Y.K.); [email protected] (Y.J.) Correspondence: [email protected] (M.G.L.); [email protected] (S.K.); Tel.: +82-219-2338 (M.G.L.); +82-42-868-7219 (S.K.) These authors contributed equally to this operate.Citation: Kim, G.E.; Kim, H.; Woo, K.; Kang, Y.; Lee, S.-H.; Jeon, Y.; Lee, M.G.; Kwon, S. Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Approach. Appl. Sci. 2021, 11, 9571. https://doi.org/10.3390/ app11209571 Academic Editor: Arkadiusz Gola Received: 17 September 2021 Accepted: 7 October 2021 Published: 14 OctoberAbstract: We aimed to increase the processing area on the roll-to-roll (R2R) nanoimprint lithography (NIL) process for high productivity, employing a lengthy roller. It truly is popular for a lengthy roller to have bending deformation, geometric errors and misalignment. This causes the non-uniformity of make contact with pressure amongst the rollers, which leads to defects for example non-uniform patterning. The non-uniformity from the get in touch with stress of your standard R2R NIL method was investigated through finite element (FE) analysis and experiments in the conventional technique. To resolve the issue, a brand new large-area R2R NIL uniform pressing system with 5 multi-backup rollers was proposed and manufactured instead of the conventional system. As a preliminary experiment, the possibility of uniform make contact with pressure was confirmed by utilizing only the pressure at both ends and one backup roller within the center. A much more even contact pressure was accomplished by using all five backup rollers and applying an acceptable pushing force to each and every backup roller. Machine studying approaches have been applied to find the optimal mixture from the pushing forces. Inside the traditional pressing method, it was confirmed that pressure deviation from the contact region occurred at a degree of 44 ; when the enhanced system was applied, stress deviation dropped to five . Search phrases: roller bending; speak to pressure; roll-to-roll procedure; nanoimprint lithography; higher productivity1. Introduction Nanoimprint lithography (NIL), which was introduced by Chou in 1995, has been regarded as a promising technologies with outstanding positive aspects. Based on the mechanical deformation of a curable resist, NIL is a fabrication strategy in which a substrate is coated in addition to a desired pattern is pressed in to the coating to replicate an inverse pattern [1]. Because it tends to make it doable to effortlessly replicate patterns making use of molds with fine patterns, NIL technologies is extremely applicable towards the manufacturing procedure of functional optical devices, semiconductors or displ.
